Systems and methods for managing pressure and flow rate
AssigneeSunita Rani
InventorSunil Kumar
Life of this patent
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AssigneeSunita Rani
InventorSunil Kumar
Estimating the term…
A device for controlling fluid flow pressure and flow rate is disclosed. The device includes a first orifice plate, a second orifice plate housed in a tubular structure. The first orifice plate includes a first orifice of a first diameter (d1) and the first orifice is positioned near an edge of the first orifice plate. The second orifice plate includes a second orifice of a second diameter (d2) and the second orifice is positioned near an edge of the second orifice plate. The tubular structure has an effective diameter (D) comprising the first orifice plate and the second orifice plate placed at perpendicular direction to the fluid flow within the tubular structure, separated by an optimum distance (X).
A device for managing pressure and flow rate of a fluid comprising:
An apparatus for managing pressure and flow rate of fluid flow comprising:
A method of manufacturing a device for controlling pressure and flow rate of a fluid flow, the method comprising:
Dependencies are inferred from the claim text.