Metal gate features of semiconductor die

A CMOS semiconductor die comprising:

• a substrate;
• an insulation layer over a major surface of the substrate;
• a plurality of P-metal gate areas within the insulation layer collectively covering a first area of the major surface within a first device region over the major surface;
• a plurality of N-metal gate areas within the insulation layer collectively covering a second area of the major surface within the first device region;
• a plurality of dummy P-metal gate areas within the insulation layer collectively covering a third area of the major surface within a second device region over the major surface;
• and
• a plurality of dummy N-metal gate areas within the insulation layer collectively covering a fourth area of the major surface within the second device region,
• wherein a first ratio of the first area to the second area is equal to or greater than 1, and a second ratio of the third area to the fourth area is substantially equal to the first ratio.

A CMOS semiconductor die comprising:

• a substrate;
• a plurality of P-metal gate areas over the substrate within a first device region;
• a plurality of N-metal gate areas over substrate within the first device region;
• a plurality of dummy P-metal gate areas over the substrate within a second device region, the second device region being different from the first device region;
• and
• a plurality of dummy N-metal gate areas over the substrate within the second device region;
• wherein a surface area of the first device region is larger than the second device region, N-metal gate areas of the plurality of N-metal gate areas within the first device region individually differ in size compared to the dummy N-metal gate areas of the plurality of dummy N-metal gate areas within the second device region, and the P-metal gate areas of the plurality P-metal gate areas within the first device region individually differ in size compared to the dummy P-metal gate areas of the plurality of dummy P-metal gate areas within the second device region.