Extraction electrode assembly voltage modulation in an ion implantation system
AssigneeAxcelis Technologies, Inc.
InventorsNeil K. Colvin, Jincheng Zhang
Life of this patent
Estimating the term…
Loading patent…
AssigneeAxcelis Technologies, Inc.
InventorsNeil K. Colvin, Jincheng Zhang
Estimating the term…
A method is disclosed for reducing particle contamination in an ion implantation system, wherein an ion beam is created via the ion source operating in conjunction with an extraction electrode assembly. A cathode voltage is applied to the ion source for generating ions therein, and a suppression voltage is applied to the extraction assembly for preventing electrons in the ion beam from being drawn into the ion source. The suppression voltage is selectively modulated, thereby inducing a current flow or an arc discharge through the extraction assembly to remove deposits on surfaces thereof to mitigate subsequent contamination of workpieces. An improvement to an ion implantation system is also disclosed in accordance with the foregoing, wherein a controller is configured to selectively modulate a voltage between a predetermined voltage and a predetermined suppression voltage generally concurrent with the transferring of the workpiece, thereby inducing a current flow or an arc discharge through the extraction electrode assembly to remove deposits on surfaces thereof to mitigate subsequent contamination of workpieces.
A method for reducing particle contamination in an ion implantation system, the method comprising the steps of:
An improvement to an on implantation system for reducing particle contamination therein, the on implantation system comprising:
Dependencies are inferred from the claim text.