Functional thin film for touch screen and method for forming the same
AssigneeResearch & Business Foundation Sungkyunkwan University
InventorsJeongeon Han, Yoonseok Choi, Su Bong Jin
Life of this patent
Estimating the term…
Abstract
Provided is a functional thin film forming method comprising: (a) forming a transparent semiconductor layer on a substrate; (b) adjusting a surface resistance of the transparent semiconductor layer by performing a n-type doping process on the transparent semiconductor layer formed in the step (a); and (c) forming an insulating protective film of SiOx on the transparent semiconductor layer of which the surface resistance is adjusted in the step (b), wherein the surface resistance of the transparent semiconductor layer is in a range of from 10 MΩ/□ to 100 MΩ/□.
Claims8
A functional thin film forming method comprising:
- (a) forming a transparent semiconductor layer on a substrate;
- (b) adjusting a surface resistance of the transparent semiconductor layer by performing a n-type doping process on the transparent semiconductor layer formed in the step (a);
- and
- (c) forming an insulating protective film of SiOx on the transparent semiconductor layer of which the surface resistance is adjusted in the step (b),
- wherein the surface resistance of the transparent semiconductor layer is in a range of from 10 MΩ/□ to 100 MΩ/□.
Dependencies are inferred from the claim text.