Resist composition and method of forming resist pattern

A resist composition comprising a base component (A) which exhibits changed solubility in a developing solution under action of acid, a basic-compound component (C) and an acid-generator component (B) which generates acid upon exposure,

• the acid-generator component (B) comprising an acid generator (B1) comprised of a compound represented by general formula (b1) shown below, and
• the basic-compound component (C) comprising at least one member selected from the group consisting of a compound (C1) represented by general formula (c1) shown below and a compound (C3) represented by general formula (c3) shown below:
• wherein Z1 represents a ring skeleton-containing hydrocarbon group of 3 to 30 carbon atoms with or without a substituent;
• Q1 represents a divalent linking group containing an oxygen atom;
• Y1 represents a fluorinated alkylene group of 1 to 4 carbon atoms with or without a substituent;
• M+ represents an organic cation;
• R1 represents a fluorinated alkyl group with or without a substituent or a hydrocarbon group with or without a substituent;
• each L1+ independently represents a sulfonium or an iodonium;
• Z2 represents a hydrogen atom or a hydrocarbon group of 1 to 30 carbon atoms with or without a substituent;
• provided that, in formula (c1), when R1 contains no fluorine atom, L1+ contains a fluorine atom in a substituent thereof;
• R2 represents an organic group;
• Y3 represents a linear, branched or cyclic alkylene group or an arylene group;
• and Rf represents a hydrocarbon group containing a fluorine atom.