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AssigneeApplied Materials, Inc.
InventorsDavid Thompson, Jeffrey W. Anthis, David Knapp, Benjamin Schmiege
Estimating the term…
Cobalt-containing films, as well as methods for providing the cobalt-containing films. Certain methods pertain to exposing a substrate surface to a precursor and a co-reactant to provide a cobalt-containing film, the first precursor having a structure represented by: wherein each R is independently C1-C6 substituted or un-substituted alkanes, branched or un-branched alkanes, substituted or un-substituted alkenes, branched or un-branched alkenes, substituted or un-substituted alkynes, branched or un-branched alkynes or substituted or un-substituted aromatics, L is a coordinating ligand comprising a Lewis base.
A method of depositing a cobalt-containing film, the method comprising exposing a substrate surface to a precursor and a co-reactant to provide a cobalt-containing film, the first precursor having a structure represented by:
A method of depositing a cobalt-containing film, the method comprising exposing a substrate surface to a precursor and a co-reactant, the first precursor having a structure represented by:
A method of depositing a cobalt-containing film, the method comprising exposing a substrate surface to a precursor and a co-reactant comprising NH3 to provide a cobalt-containing film, the first precursor having a structure represented by:
Dependencies are inferred from the claim text.