Tablet for ion plating, production method therefor and transparent conductive film
AssigneeSumitomo Metal Mining Co., Ltd.
InventorsTokuyuki Nakayama, Yoshiyuki Abe
Life of this patent
Estimating the term…
Loading patent…
AssigneeSumitomo Metal Mining Co., Ltd.
InventorsTokuyuki Nakayama, Yoshiyuki Abe
Estimating the term…
A tablet for ion plating enables to attain high rate film-formation of a transparent conductive film suitable for a blue LED or a solar cell, and a noduleless film-formation not generating splash, an oxide sintered body most suitable for obtaining the same, and a production method thereof. A tablet for ion plating obtained by processing an oxide sintered body includes indium and cerium as oxides, and having a cerium content of 0.3 to 9% by atom, as an atomicity ratio of Ce/(In+Ce). The oxide sintered body has an In2O3 phase of a bixbyite structure as a main crystal phase, has a CeO2 phase of a fluorite-type structure finely dispersed as crystal grains having an average particle diameter of equal to or smaller than 3 μm, as a second phase. The oxide sintered body is produced by (a) mixing raw material powder consisting of indium oxide powder with an average particle diameter of equal to or smaller than 1.5 μm, then (b) molding the mixed powder, and sintering the molding by a normal pressure sintering method, or (b′) molding and sintering the mixed powder by a hot press method.
A tablet for ion plating obtained by processing an oxide sintered body, comprising indium and cerium as oxides,
Dependencies are inferred from the claim text.