Magnet arrangement for a target backing tube, target backing tube including the same, cylindrical target assembly and sputtering system

A magnet arrangement for a sputtering system having a rotatable target, wherein the magnet arrangement comprises:

• a first magnet element extending along a first axis, wherein the first magnet element has, in the direction of the first axis, a first end and a second end opposite to the first end;
• two second magnet elements, each second magnet element extending in parallel to the first axis and being symmetrically arranged on opposite sides to the first axis, wherein each second magnet element has a first end and second end;
• wherein the first end of each second magnet element is arranged on a side of the first end of the first magnet element;
• and
• wherein the second end of each second magnet element is arranged on a side of the second end of the first magnet element;
• a third magnet element connecting the first ends of the two second magnet elements;
• and
• a fourth magnet element connecting the second ends of the two second magnet elements, such that the second magnet elements, the third magnet element, and the fourth magnet element surround the first magnet element;
• wherein a magnetic axis of the third magnet element is inclined with respect to a first plane being orthogonal to the first axis;
• and
• wherein either:
• the magnetic axis of the two second magnet elements are anti-parallel to the magnetic axis of the first magnetic element within the rotatable target;
• or
• the magnetic axis of the two second magnet elements are perpendicular to the surface of the rotatable target.