Lithography mask repairing process
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsChien-Hsing Lu, Chung-Hung Lin, Chih-Wei Wen
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Abstract
A method includes performing a beam scan on a photolithography mask to repair the photolithography mask. After the beam scan, a radiation treatment is performed on the photolithography mask. The method is performed by an apparatus including a beam generator configured to generate and project a beam on the lithography mask, a radiation source configured to generate a radiation on the lithography mask, and a process gas source configured to release a process gas onto the lithography mask. The process as reacts with a surface portion of the lithography mask to repair the lithography mask. With the radiation treatment, residue process gas on the lithography mask is removed.
Claims21
A method comprising:
- performing a first beam scan on a photolithography mask to repair the photolithography mask;
- and
- after the first beam scan, performing a first radiation treatment on the photolithography mask.
A method comprising:
- performing a first beam scan on a photolithography mask to repair the photolithography mask, wherein the first beam scan comprises:
- introducing a process gas into a process chamber, with the photolithography mask located in the process chamber, wherein the process gas is configured to react with a portion of the photolithography mask;
- and
- projecting a beam on undesirable portions of the photolithography mask to remove undesirable portions of the photolithography mask;
- and
- after the first beam scan, performing a first radiation treatment on the photolithography mask using a radiation, wherein the radiation has a quantum energy greater than a bond energy between atoms of molecules of the process gas.
A method comprising:
- performing a radiation treatment on a photolithography mask to break bonds in molecules of a process gas attached to the photolithography mask, wherein the photolithography mask is configured to be used in a photolithography process.
Dependencies are inferred from the claim text.