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US 8,999,181 B2Granted
Method for manufacturing ridge-type waveguide
AssigneeHon Hai Precision Industry Co., Ltd.
InventorHsin-Shun Huang
Life of this patent
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Abstract
In a method for manufacturing a ridge-type waveguide, a substrate is provided. An etching resistance stripe is coated on the substrate. The substrate with the etching resistance stripe is subjected to a wet etching process to form a ridge under the etching resistance stripe. The etching resistance stripe is removed. A titanium stripe is then coated onto the ridge and diffused into the ridge to form a waveguide in the ridge by a high temperature diffusing process.
Claims13
A method for manufacturing a ridge-type waveguide, the method comprising:
- providing a substrate made of lithium niobate crystal;
- coating an etching resistance stripe on the substrate;
- dipping the substrate with the etching resistance stripe into a first etchant to form a ridge under the etching resistance stripe using a first wet etching process;
- removing the etching resistance stripe;
- coating a titanium stripe on the ridge;
- and
- diffusing the titanium stripe into the ridge to form a waveguide in the ridge by a thermal diffusing process at a selected temperature.
4 more elements
Dependencies are inferred from the claim text.