Apparatus for forming thin film

A thin film forming apparatus comprising:

• a plurality of vapor deposition sources separated from each other;
• a plurality of nozzle bodies connected to upper portions of the vapor deposition sources;
• and
• a plurality of nozzles connected to upper portions of the nozzle bodies,
• wherein a nozzle hole of each of the nozzles is formed on a same vapor deposition line, and
• wherein each of the nozzle holes is the same size to uniformly mix a plurality of organic materials contained in the plurality of vapor deposition sources,
• wherein the plurality of vapor deposition sources comprise a first vapor deposition source and a second vapor deposition source having a first gap therebetween,
• the plurality of nozzle bodies comprise a first nozzle body connected to an upper portion of the first vapor deposition source and a second nozzle body connected to an upper portion of the second vapor deposition source,
• the plurality of nozzles comprises a plurality of first nozzles connected to an upper portion of the first nozzle body and a plurality of second nozzles connected to an upper portion of the second nozzle body, and
• all of first nozzle holes of the first nozzles and all of second nozzle holes of the second nozzles are disposed on the same vapor deposition line.