Apparatus and methods for handling workpieces in a processing system

A method of processing a workpiece supported on a pedestal portion of a lower electrode in a process chamber of a processing system, the method comprising:

• transferring a workpiece to a lift plate disposed at a first position between the lower electrode and an upper electrode inside the process chamber and in a non-contacting relationship with the pedestal portion;
• supporting the workpiece about an opening in the lift plate while the lift plate is disposed at the first position;
• moving the lift plate vertically from the first position toward the pedestal portion of the lower electrode and to a second position at which the workpiece is transferred from the lift plate to the pedestal portion;
• generating a plasma inside the process chamber using the lower electrode and the upper electrode after the workpiece is transferred from the opening in the lift plate to the pedestal portion;
• and
• processing the workpiece with the plasma while the workpiece is supported on the pedestal portion of the lower electrode.