Method for creating mask data, program, information processing apparatus, and method for manufacturing mask

A method for creating data regarding a mask to be used by an exposure apparatus that exposes a substrate by illuminating the mask and projecting an image of pattern on the mask onto the substrate using a projection optical system, the method being executed by a computer, the method comprising the steps of:

• obtaining, for each of a plurality of cells, data regarding a first corrected pattern on a single cell corrected such that an evaluation value of a pattern formed on the substrate after an image of a pattern on the single cell is projected onto a resist on the substrate and the resist is developed become close to a target value;
• obtaining, for each of the plurality of cells, a first evaluation value obtained by evaluating a projected image of the first corrected pattern on the single cell generated by the projection optical system;
• calculating, when the plurality of cells are arranged adjacent to one another, a second evaluation value obtained by evaluating the projected images of the first corrected patterns on the plurality of cells generated by the projection optical system;
• creating second corrected patterns by correcting the first corrected patterns on the plurality of cells arranged adjacent to one another such that the second evaluation value becomes close to the first evaluation value;
• and
• creating the data regarding the mask including the second corrected patterns on the plurality of cells arranged adjacent to one another.