Mask, pattern disposing method thereof and exposing method thereof
AssigneeMacronix International Co., Ltd.
InventorsShih-Rung Wu, Shao-Wei Hsieh
Life of this patent
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Abstract
A mask, a pattern disposing method thereof and an exposing method thereof are provided. A plurality of geometric patterns are arranged on the mask along a plurality of columns. The arrangement of the patterns arranged along odd columns is similar to that of the patterns arranged along even columns. Two odd columns or two even columns are selected to be a first edge column and a second edge column respectively. At each corresponding position of the first edge column and the second edge column, only one of the first edge column and the second edge column is selected to be disposed one geometric pattern.
Claims15
A pattern disposing method of a mask, comprises:
- arranging a plurality of geometric patterns on a base along a plurality of columns, wherein a plurality of arrangements of the patterns arranged along odd columns are similar, and a plurality of arrangements of the patterns arranged along even columns are similar;
- selecting two odd columns or two even columns to be a first edge column and a second edge column respectively;
- and
- selecting only one of the first edge column and the second edge column to be disposed one geometric pattern at each corresponding position of the first edge column and the second edge column.
An exposing method of a mask, comprising:
- providing a mask having a base and a plurality of geometric patterns, wherein the geometric patterns are arranged on the base along a plurality of columns, a plurality of arrangements of the patterns arranged along odd columns are similar, a plurality of arrangements of the patterns arranged along even columns are similar, the mask has a first edge column and a second edge column, and only one of the first edge column and the second edge column is selected to be disposed one geometric pattern at each corresponding position of the first edge column and the second edge column;
- and
- repeatedly exposing a substrate, wherein the first edge column is partially overlapped with the second edge column which is previously exposed.
A mask, comprising:
- a base;
- and
- a plurality of geometric patterns, arranged on the base along a plurality of columns, wherein a plurality of arrangements of the patterns arranged along odd columns are similar, and a plurality of arrangements of the patterns arranged along even columns are similar;
- wherein, the mask has a first edge column and a second edge column, and only one of the first edge column and the second edge column is selected to be disposed one geometric pattern at each corresponding position of the first edge column and the second edge column.
Dependencies are inferred from the claim text.