Process for forming silver films on silicon
OwnerFaris Modawar, Jeff Miller +4inventors
InventorsFaris Modawar, Jeff Miller, Mike Jura, Brian Murphy, Marcie Black, Brent A. Buchine
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Abstract
A process is provided for etching a silicon-containing substrate. In the process, the surface of the substrate is cleaned. A film of alumina is deposited on the cleaned substrate surface. A silver film is deposited above the film of alumina. An etchant comprising HF is contacted with the silver film.
Claims14
A process for etching a silicon-containing substrate, comprising the steps of (a) cleaning a surface of the substrate, (b) depositing a film on the cleaned substrate surface, (c) depositing a silver film on the film deposited in step (b), and (d) contacting the silver with an etchant comprising HF, wherein the film deposited in step (b) can be etched by an etchant comprising HF, and wherein the silver film deposited in step (c) is substantially uniform, wherein the etching of step (d) is silver-assisted;
- wherein the film described in step (b) comprises alumina.
Dependencies are inferred from the claim text.