Method and apparatus for vapor generation and wafer cleaning
AssigneeMSP Corporation
InventorsThuc M. Dinh, Yamin Ma, Benjamin Y. H. Liu
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Abstract
The present disclosure describes an apparatus and a method for generating IPA vapor for condensation on a substrate in order to provide a vapor that is substantially free of particulate and molecular contaminants. The apparatus includes an inlet for liquid to enter, and a plurality of heated sloped surfaces to create thin sheets of flowing liquid on the surfaces from which the liquid can vaporize to form vapor. The liquid flows from one surface to another, vaporizing the liquid.
Claims22
An apparatus for vaporizing a liquid to form vapor, said apparatus including an inlet for liquid to enter, and a plurality of heated sloped surfaces to create thin sheets of liquid on the surfaces from which the liquid can vaporize to form vapor.
A method to vaporize a liquid to form vapor, said method comprising
- heating an apparatus to a selected set-point temperature wherein the apparatus comprises a plurality of heated sloped surfaces to create a thin sheet of liquid on the surfaces from which the liquid can vaporize to form vapor,
- introducing said liquid through an inlet of the apparatus such that a thin sheet of the liquid is formed on the sloped surfaces, and
- controlling the rate of liquid flow to a selected set-point value.
A method for generating isopropyl alcohol (IPA) vapor for condensation on a substrate to produce a surface on the substrate substantially free of particulate contaminants, the method comprising:
- providing a thin sheet of flowing liquid IPA on an inclined heated surface, sufficiently heated to produce IPA vapor, the thin sheet of IPA liquid being sufficiently thin so that the liquid will vaporize from the liquid surface substantially free of bubbles and the formation of residue contaminant particles;
- and
- flowing the liquid over a plurality of inclined heated surfaces arranged so that the liquid IPA flows sequentially over the plurality of surfaces.
Dependencies are inferred from the claim text.