Diffuser structure and manufacturing method thereof
AssigneeGlobal Material Science Co., Ltd.
InventorsByung-jun Park, Jin-jong Su, Fang-yu Liu
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Abstract
A diffuser structure and a manufacturing method thereof are disclosed. The diffuser structure includes a substrate, a plurality of throughholes, and a glue layer. The throughholes are perpendicularly formed in the substrate. Each throughhole includes a gas-in part, a gas-out part, and a connecting part for connecting the gas-in part to the gas-out part. The glue layer is formed on a side wall of each gas-out part, and a thickness of the glue layer is between 1 μm and 11 μm. The present invention can solve a problem that particles are periodically generated after a periodic self-cleaning function is implemented in a plasma-enhanced chemical vapor deposition system.
Claims22
A diffuser structure, positioned in a plasma-enhanced chemical vapor deposition reaction chamber, the diffuser structure comprising:
- a substrate;
- a plurality of throughholes, formed perpendicularly in the substrate, each of the throughholes comprising:
- a gas-in part;
- a gas-out part;
- and
- a connecting part, for connecting the gas-in part to the gas-out part;
- and
- an anodized glue layer, formed on a side wall of each gas-out part, wherein a thickness of the anodized glue layer is between 1 μm and 11 μm.
A manufacturing method of a diffuser structure, the diffuser structure comprising a substrate and a plurality of throughholes formed perpendicularly in the substrate, each of the throughholes comprising a gas-in part, a gas-out part, and a connecting part for connecting the gas-in part and the gas-out part, the manufacturing method comprising steps of:
- cleaning the diffuser structure by using a chemical solution;
- and
- forming a glue layer on a side wall of each gas-out part, wherein a thickness of the glue layer is between 1 μm and 11 μm.
Dependencies are inferred from the claim text.