Exposure method, exposure apparatus, and device manufacturing method
AssigneeNikon Corporation
InventorsKenichi Shiraishi, Tomoharu Fujiwara
Life of this patent
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Abstract
An exposure apparatus comprises a movable member that moves under a projection optical system while holding a substrate; and an immersion nozzle that has a supply port and forms a immersion region under the projection optical system by supplying a liquid to an image plane side of the projection optical system via the supply port. The supply port is provided to a lower surface of the immersion nozzle and the liquid is supplied downwardly from the supply port. A contact area of the immersion region with a surface of the substrate has a rhomboid shape.
Claims28
An exposure apparatus that exposes a substrate via a projection optical system and a liquid immersion region formed under the projection optical system, comprising:
- a movable member that is configured to move under the projection optical system while holding the substrate;
- and
- an immersion nozzle that has a supply port and forms the immersion region under the projection optical system by supplying a liquid to an image plane side of the projection optical system via the supply port, the supply port being provided to a lower surface of the immersion nozzle and the liquid being supplied downwardly from the supply port,
- wherein a contact area of the immersion region with a surface of the substrate has a rhomboid shape.
An exposure method used in an exposure apparatus which exposes a substrate held by a movable member via a projection optical system and a liquid immersion region formed under the projection optical system, comprising:
- moving the movable member to a space under the projection optical system while holding the substrate;
- forming the immersion region under the projection optical system by supplying a liquid to an image plane side of the projection optical system via a supply port of an immersion nozzle, the supply port being provided to a lower surface of the immersion nozzle and the liquid being supplied downwardly from the supply port;
- and
- exposing the substrate via the liquid immersion region,
- wherein a contact area of the immersion region with a surface of the substrate has a rhomboid shape.
Dependencies are inferred from the claim text.