Lithographic apparatus and device manufacturing method

An exposure apparatus, comprising:

• a projection system configured to project a beam of radiation onto a radiation-sensitive substrate;
• a liquid confinement structure configured to at least partly confine an immersion liquid in a space between the projection system and the substrate such that the immersion liquid is in direct contact with the projection system and the liquid confinement structure, the liquid confinement structure having a bottom surface extending laterally from a path of the beam of radiation through the liquid and an outlet, in the bottom surface, configured to remove immersion liquid, the liquid confinement structure configured to supply a cleaning fluid to contact the bottom surface during a cleaning operation;
• and
• a stage movable with respect to the liquid confinement structure, the stage having a substantially flat upper surface and having, flush with or below the upper surface, a cleaning device, the cleaning device comprising an ultrasonic emitter configured to provide sonic waves to the cleaning fluid or an optical element to supply radiation to the cleaning fluid.

A device manufacturing method, comprising:

• projecting a beam of radiation, using a projection system, onto a radiation-sensitive substrate;
• at least partly confining a liquid in a space between the projection system and the substrate using a liquid confinement structure such that the liquid is in direct contact with the projection system and the liquid confinement structure, the liquid confinement structure having an outlet configured to remove liquid from the space, the outlet being in a bottom surface of the liquid confinement structure and located on opposite sides of a path of the beam of radiation through the liquid;
• moving a stage with respect to the liquid confinement structure, the stage having an upper surface of at least same width as the width between the locations of the outlet on opposite sides of the path of the beam of radiation and the stage having a cleaning device located in or under the upper surface;
• and
• cleaning a surface of the projection system, of the liquid confinement structure, or of both the projection system and the liquid confinement structure, using the cleaning device.