Layout re-decomposition for multiple patterning layouts

A system for layout re-decomposition, comprising:

• one or more processing units;
• and
• memory comprising processor-executable instructions that when executed by at least one of the one or more processing units perform a method, comprising:
• defining a pattern layout correlation between an original layout and a new layout, the new layout corresponding to a change order to the original layout, a pattern area of the new layout different than a pattern area of the original layout, where the pattern area of the new layout corresponds to an amount of area within the new layout occupied by polygons and the pattern area of the original layout corresponds to an amount of area within the original layout occupied by polygons;
• generating a bipartite graph comprising a first set of nodes representing one or more new pattern portions within the new layout and a second set of nodes representing one or more original pattern portions within the original layout;
• and
• performing a bipartite matching technique upon the bipartite graph to define a pattern color similarity between the original layout and the new layout;
• and
• assigning one or more pattern colors to the new layout based upon the pattern layout correlation and the pattern color similarity.

A non-transitory computer readable medium comprising instructions which when executed at least in part via a processing unit perform a method for layout re-decomposition, comprising:

• defining a pattern layout correlation between an original layout and a new layout for an integrated circuit, the new layout corresponding to a change order to the original layout, comprising:
• calculating a first pattern layout correlation based upon an overlapping area factor corresponding to a positional correlation of an original pattern portion within the original layout and a new pattern portion within the new layout;
• defining pattern color similarity between the original layout and the new layout;
• and
• assigning one or more pattern colors to the new layout based upon the pattern layout correlation and the pattern color similarity, a first pattern color corresponding to a first pattern mask and a second pattern color corresponding to a second pattern mask.