Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsTammo Uitterdijk, Erik Roelof Loopstra, Laurens Anthony Sanderse
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Abstract
In an immersion lithographic apparatus, a final element is disclosed having, on a surface nearest the substrate, a layer bonded to the surface and having an edge barrier, of the same material as the layer, extending from the layer away from the substrate to shield the final element from a liquid. In an embodiment, the final element is attached to the apparatus via the layer and/or edge barrier, which may be made of a material with a coefficient of thermal expansion lower than the coefficient of thermal expansion of the final element.
Claims20
A lithographic projection apparatus, comprising:
- a projection system configured to project a patterned beam of radiation onto a substrate, the projection system comprising a final element having, on a surface nearest the substrate, a layer overlying the surface of the final element, and comprising an edge barrier, not directly in contact with the final element, shielding the final element from the liquid;
- and
- a liquid supply system configured to at least partly fill a space between the final element of the projection system and the substrate with a liquid.
A lithographic projection apparatus, comprising:
- a projection system configured to project a patterned beam of radiation onto a substrate, the projection system comprising a final element having a layer contacting a surface of the final element nearest the substrate and comprising an edge barrier, connected to the layer and spaced apart from a side surface of the final element at least at a point where the edge barrier and the layer connect, shielding the final element from the liquid;
- and
- a liquid supply system configured to at least partly fill a space between the final element of the projection system and the substrate with a liquid.
A device manufacturing method, comprising:
- projecting a patterned beam of radiation onto a substrate through a liquid provided in a space between a final element of a projection system and the substrate, wherein the final element has on a surface nearest the substrate a layer overlying the surface of the final element;
- and
- shielding the final element from the liquid using an edge barrier that is not directly in contact with the final element.
Dependencies are inferred from the claim text.