Photo-imageable hardmask with positive tone for microphotolithography
OwnerSam Xunyun Suninventor
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OwnerSam Xunyun Suninventor
Estimating the term…
Disclosed are the deactivation mechanism and chemistry platforms that make high-silicon hardmask films photo-imageable like positive-tone photoresist for microphotolithography. The deactivation mechanism requires a catalyst to promote crosslinking reactions, and a photoacid generator to deactivate the catalyst. The initial hardmask films are soluble in developers. If not radiated, films become insoluble in developers due to crosslinking reactions promoted by catalyst. If radiated, films remain soluble in developers due to deactivation of catalyst by photoacid generator. Compositions of positive-tone photo-imageable hardmask based on the chemistry of polysiloxane and polysilsesquioxanes are disclosed as well. Also disclosed is a method of modifying polysiloxane and polysilsesquioxane films for controlled diffusion of catalysts, photoacid generators, and quenchers. Further disclosed are processes of using photo-imageable hardmasks to create precursor structures on semiconductor substrates with or without an intermediate layer.
A method of photoimaging silicon hardmask films with a positive tone, and the method comprising:
A method of modifying films for desired diffusion length of catalysts, photoacid generators, and quenchers in photo-imageable silicon hardmasks, said method comprising of:
Compositions of photo-imageable hardmask with positive tone, said compositions comprising of:
Dependencies are inferred from the claim text.