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US 8,911,927 B2Granted
Compositions and processes for immersion lithography
AssigneeRohm and Haas Electronic Materials LLC
InventorsMichael K. Gallagher, Gerald B. Wayton, Gregory P. Prokopowicz, Stewart A. Robertson
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Abstract
The present invention relates to barrier layer compositions that are applied above a photoresist composition for immersion lithography processing. In a further aspect, new methods are provided for immersion lithography processing.
Claims10
A method for processing a photoresist composition, comprising:
- (a) applying on a substrate a photoresist composition;
- (b) treating the applied photoresist composition with a fluid composition comprising isopropanol to remove photoresist composition materials that can migrate into an immersion fluid during a subsequent step of immersion exposing the photoresist layer;
- and
- (c) immersion exposing the photoresist layer to radiation activating for the photoresist composition;
- wherein a barrier composition is applied above the treated photoresist composition layer.
2 more elements
A method for processing a photoresist composition, comprising:
- (a) applying on a substrate a photoresist composition;
- (b) treating the applied photoresist composition with a fluid composition comprising isopropanol;
- (c) applying a barrier composition above the treated photoresist composition layer;
- and
- (d) immersion exposing the photoresist layer to radiation activating for the photoresist composition
2 more elements
Dependencies are inferred from the claim text.