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AssigneeTanka Kikinzoku Kogyo K.K.
InventorsKazuharu Suzuki, Shunichi Nabeya, Masayuki Saito
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A chemical deposition method for producing a platinum thin film or a platinum compound thin film by chemical vapor deposition of an organoplatinum compound is represented by the following formula, which includes a divalent platinum atom, and hexadiene or a hexadiene derivative and alkyl anions coordinated to the divalent platinum atom. In the following formula, R1 and R2 are each an alkyl group, and may be different from each other. R3 and R4 are each a hydrogen atom or an alkyl group, and may be different from each other. The organoplatinum compound is satisfactory in stability and generates no toxic substance in film formation, and hence is satisfactory in handleability and excellent in practicability. The organoplatinum compound has a high vapor pressure, enables the film formation at a low temperature, and is useful as a CVD raw material easily forming a film on a spatial structure.
A chemical vapor deposition method for forming a platinum thin film or a platinum compound thin film, comprising the steps of vaporizing an organoplatinum compound to be a raw material compound to prepare a reaction gas, introducing the resulting reaction gas onto the surface of a substrate, and decomposing the organoplatinum compound to deposit platinum, wherein said method uses, as the organoplatinum compound, the organoplatinum compound,
Dependencies are inferred from the claim text.