Edge ring assembly with dielectric spacer ring
AssigneeLam Research Corporation
InventorsJeremy Chang, Andreas Fischer, Babak Kadkhodayan
Life of this patent
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Abstract
An edge ring assembly surrounds a substrate support surface in a plasma etching chamber. The edge ring assembly comprises an edge ring and a dielectric spacer ring. The dielectric spacer ring, which surrounds the substrate support surface and which is surrounded by the edge ring in the radial direction, is configured to insulate the edge ring from the baseplate. Incorporation of the edge ring assembly around the substrate support surface can decrease the buildup of polymer at the underside and along the edge of a substrate and increase plasma etching uniformity of the substrate.
Claims9
A dielectric spacer ring dimensioned so as to provide a clearance gap between a lower surface of a substrate located on a substrate support surface in a plasma etching chamber and an upper surface of the dielectric spacer ring wherein the clearance gap allows for thermal expansion of the dielectric spacer ring during plasma etching of the substrate, the dielectric spacer ring being further dimensioned so as to be surrounded by an edge ring dimensioned so as to underlie the substrate and provide a clearance gap between a lower surface of the substrate and an upper surface of the edge ring wherein the dielectric spacer ring comprises an axially upward extending portion formed on a radially inner surface of a coupling ring;
- wherein the dielectric spacer ring has a width of from about 0.5 to 2.5 mm and a height of from about 1 to 3 mm;
- wherein the dielectric spacer ring is configured to electrically insulate the edge ring from the substrate support.
Dependencies are inferred from the claim text.