Radiation-sensitive resin composition
AssigneeJsr Corporation
InventorsMitsuo Sato, Kazuo Nakahara, Hiromitsu Nakashima
Life of this patent
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Abstract
The radiation-sensitive resin composition includes a compound represented by a following formula (1), and a resin. The resin has an acid-dissociable group, is insoluble or hardly soluble in an alkali, and turns to be soluble in an alkali when the acid-dissociable group is dissociated. R represents a hydrogen atom or a hydrocarbon group having 1 to 20 carbon atoms, R1 represents a hydrocarbon group having 1 to 20 carbon atoms or the like, R2 to R5 each independently represent an alkyl group having 1 to 4 carbon atoms, an alicyclic hydrocarbon group having 4 to 20 carbon atoms, or the like, and R6 represents a halogen atom or the like.
Claims4
A radiation-sensitive resin composition comprising:
- a compound represented by a following formula (1);
- a resin component comprising:
- a base resin having an acid-dissociable group, being insoluble or hardly soluble in an alkali, and being soluble in an alkali in a state where the acid-dissociable group is dissociated;
- and
- optionally, a radiation sensitive acid generator which is at least one selected from the group consisting of an onium salt, an organic halogen compound, and a sulfone compound,
- wherein, in the formula (1),
- R represents a hydrogen atom or a hydrocarbon group having 1 to 20 carbon atoms,
- R1 represents a hydrocarbon group having 1 to 20 carbon atoms, and optionally an ester bond or an ether bond is included in a skeleton chain of the hydrocarbon group,
- R2 to R5 each independently represent an alkyl group having 1 to 4 carbon atoms or an alicyclic hydrocarbon group having 4 to 20 carbon atoms,
- R6 represents a halogen atom or a hydrocarbon group having 1 to 6 carbon atoms,
- n is an integer of 0 to 4, and
- in a case where n is an integer of 2 to 4, R6 present in a plurality of numbers are each a same or different.
Dependencies are inferred from the claim text.