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US 8,895,115 B2Granted
Method for producing an ionized vapor deposition coating
AssigneeSouthwest Research Institute
InventorVladimir Gorokhovsky
Life of this patent
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Abstract
A method of depositing a coating by vapor deposition. The method including ionizing a process gas, generating a metal vapor and creating a metal flow having a metal atom flow density in the range of 1E14 m−3 to 1E24 m−3. The method also includes providing a thermionic emission from a thermionic ionizing grid including thermionic filaments, wherein said ionizing filament grid is at least partially located within said region having a metal atom flow density in the range of 1E14 m−3 to 1E24 m−3, and coating a substrate with the metal vapor.
Claims8
A method of depositing a coating by vapor deposition comprising:
- providing a substrate on a worktable;
- biasing said worktable;
- ionizing a process gas, generating a metal vapour, and creating a metal flow;
- providing a thermionic emission from a thermionic ionizing grid including thermionic filaments, wherein said thermionic ionizing grid is at least partially located within said metal flow in a region having a density in the range of 1E14 m−3 to 1E24 m−3 and said thermionic emission ionizes said metal flow;
- and
- coating said substrate with said metal vapor.
3 more elements
Dependencies are inferred from the claim text.