Biphenyl derivative, resist bottom layer material, bottom layer forming method, and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsDaisuke Kori, Takeshi Kinsho, Katsuya Takemura, Tsutomu Ogihara, Takeru Watanabe, Hiroyuki Urano
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Abstract
A biphenyl derivative having formula (1) is provided wherein Ar1 and Ar2 denote a benzene or naphthalene ring, and x and z each are 0 or 1. A material comprising the biphenyl derivative or a polymer comprising recurring units of the biphenyl derivative is spin coated and heat treated to form a resist bottom layer having improved properties, optimum values of n and k, step coverage, etch resistance, heat resistance, solvent resistance, and minimized outgassing.
Claims5
A biphenyl derivative having the general formula (1):
- wherein cyclic structures Ar1 and Ar2 denote a benzene or naphthalene ring, x and z are each independently 0 or 1.
A biphenyl derivative comprising a partial structure having the general formula (2):
- wherein cyclic structures Ar1 and Ar2 denote a benzene or naphthalene ring, x and z are each independently 0 or 1, L is a single bond or a C1-C20 alkylene group, and n is such a natural number as to provide a molecular weight of up to 200,000.
Dependencies are inferred from the claim text.