Magnetic supporting mechanism having a movable magnet with a varying width, exposure apparatus with the magnetic supporting mechanism, and device manufacturing method thereof

A magnetic supporting mechanism:

• a first magnet having a first magnetic pole;
• a second magnet having a second magnetic pole opposed to the first magnetic pole;
• and
• a third magnet having a third magnetic pole of a polarity identical to a polarity of the first magnetic pole and a fourth magnetic pole of a polarity identical to a polarity of the second magnetic pole,
• wherein the first and second magnets are spaced apart along a first direction to provide a gap therebetween, with the first magnetic pole and the second magnetic pole facing each other,
• wherein the third magnet is partially inserted, along a second direction, into the gap between the first magnet and the second magnet, with the first magnetic pole and the third magnetic pole facing each other and the second magnetic pole and the fourth magnetic pole face facing each other, the second direction being perpendicular to the first direction,
• wherein one of the third magnet or a pair of the first magnet and the second magnet comprises a stator unit, and the other of the third magnet or the pair of the first magnet and the second magnet comprises a movable unit that supports a supporting target, which is connected to the movable unit, and movable in the second direction,
• wherein the third magnet has a first end and a second end, which is opposite the first end, and extends between the first end and the second end along the second direction,
• wherein the first end stays inside the gap between the first magnet and the second magnet, while the second end stays outside the gap, and
• wherein when viewed from the first direction, a rate of increase in an area in which the third magnet overlaps with the first and second magnets decreases as the third magnet is inserted deeper in the gap between the first magnet and the second magnet along the second direction.

An exposure apparatus comprising:

• a stage apparatus that relatively and movably holds a substrate and an original;
• an illumination apparatus that forms illumination light to transfer a pattern of the original onto the substrate by exposure;
• a driving unit configured to drive a light-shielding unit of the illumination apparatus;
• and
• a magnetic supporting mechanism supporting the driving unit and comprising:
• a first magnet having a first magnetic pole;
• a second magnet having a second magnetic pole opposed to the first magnetic pole;
• and
• a third magnet having a third magnetic pole of a polarity identical to a polarity of the first magnetic pole and a fourth magnetic pole of a polarity identical to a polarity of the second magnetic pole,
• wherein the first and second magnets are spaced apart along a first direction to provide a gap therebetween, with the first magnetic pole and the second magnetic pole facing each other,
• wherein the third magnet is partially inserted, along a second direction, into the gap between the first magnet and the second magnet, with the first magnetic pole and the third magnetic pole facing each other and the second magnetic pole and the fourth magnetic pole face facing each other, the second direction being perpendicular to the first direction,
• wherein one of the third magnet or a pair of the first magnet and the second magnet comprises a stator unit, and the other of the third magnet or the pair of the first magnet and the second magnet comprises a movable unit that supports a supporting target, which is connected to the movable unit, and movable in the second direction,
• wherein the third magnet has a first end and a second end, which is opposite the first end, and extends between the first end and the second end along the second direction,
• wherein the first end stays inside the gap between the first magnet and the second magnet, while the second end stays outside the gap, and
• wherein an effective width extends along a third direction, across which a magnetic force acts, and is narrower at the second end than the first end, the third direction being perpendicular to both the first direction and the second direction.

A device manufacturing method comprising the steps of:

• exposing a substrate using an exposure apparatus;
• and
• developing the exposed substrate,
• wherein the exposure apparatus comprises:
• a stage apparatus that relatively and movably holds a substrate and an original;
• an illumination apparatus that forms illumination light to transfer a pattern of the original onto the substrate by exposure;
• a driving unit configured to drive a light-shielding unit of the illumination apparatus;
• and
• a magnetic supporting mechanism supporting the driving unit and comprising:
• a first magnet having a first magnetic pole;
• a second magnet having a second magnetic pole opposed to the first magnetic pole;
• and
• a third magnet having a third magnetic pole of a polarity identical to a polarity of the first magnetic pole and a fourth magnetic pole of a polarity identical to a polarity of the second magnetic pole,
• wherein the first and second magnets are spaced apart along a first direction to provide a gap therebetween, with the first magnetic pole and the second magnetic pole facing each other,
• wherein the third magnet is partially inserted, along a second direction, into the gap between the first magnet and the second magnet, with the first magnetic pole and the third magnetic pole facing each other and the second magnetic pole and the fourth magnetic pole face facing each other, the second direction being perpendicular to the first direction,
• wherein one of the third magnet or a pair of the first magnet and the second magnet comprises a stator unit, and the other of the third magnet or the pair of the first magnet and the second magnet comprises a movable unit that supports a supporting target, which is connected to the movable unit, and movable in the second direction,
• wherein the third magnet has a first end and a second end, which is opposite the first end, and extends between the first end and the second end along the second direction,
• wherein the first end stays inside the gap between the first magnet and the second magnet, while the second end stays outside the gap, and
• wherein an effective width extends along a third direction, across which a magnetic force acts, and is narrower at the second end than the first end, the third direction being perpendicular to both the first direction and the second direction.