Apparatus for and method of wafer edge exposure
AssigneeMacronix International Co., Ltd.
InventorChin Cheng Yang
Life of this patent
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Abstract
An apparatus for wafer edge exposure comprises a first exposure unit and a second exposure unit. The first exposure unit includes a first light source to emit first light of multiple wavelengths, and a first mask to direct the first light toward a first area at an edge portion of a wafer. The second exposure unit includes a second light source to emit second light of a single wavelength, and a second mask to direct the second light toward a second area at the edge portion of the wafer. The second area encloses a transition area that borders the first area under the first mask.
Claims22
An apparatus for wafer edge exposure comprising:
- a first exposure unit comprising:
- a first light source to emit first light of multiple wavelengths;
- and
- a first mask to direct the first light toward a first area at an edge portion of a wafer;
- and
- a second exposure unit comprising:
- a second light source to emit second light of a single wavelength;
- and
- a second mask to direct the second light toward a second area at the edge portion of the wafer.
An apparatus for wafer edge exposure comprising:
- a first light source to emit first light toward a first area at an edge portion of a wafer via a first mask, the first light having a first source size;
- and
- a second light source to emit second light toward a second area at the edge portion of the wafer via a second mask, the second light having a second source size smaller than the first source size.
A method of wafer edge exposure comprising:
- providing a first exposure unit to expose photoresist on a first area at an edge portion of a wafer, the first exposure unit comprising:
- a first light source to emit first light of multiple wavelengths;
- and
- a first mask to direct the first light toward the first area;
- providing a second exposure unit to expose photoresist on a second area at the edge portion of the wafer, the second exposure unit comprising:
- a second light source to emit second light of a single wavelength;
- and
- a second mask to direct the second light toward the second area;
- emitting the first light from the first light source via the first mask toward the first area;
- and
- emitting the second light from the second light source via the second mask toward the second area,
- wherein the second area encloses a transition area that borders the first area under the first mask.
Dependencies are inferred from the claim text.