Method for using a topcoat composition
AssigneeInternational Business Machines Corporation
InventorsHiroshi Ito, Linda Karin Sundberg
Life of this patent
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Abstract
A method of forming an image on a photoresist. The method includes: forming a photoresist over a substrate; applying a topcoat composition, the topcoat composition comprising at least one fluorine-containing polymer and a casting solvent, onto the photoresist; removing the casting solvent of the topcoat composition resulting in the formation of a topcoat material over the photoresist; exposing the photoresist to radiation, the radiation changing a chemical composition of the regions of the photoresist exposed to the radiation, forming exposed and unexposed regions in the photoresist; and removing i) the topcoat material and ii) the exposed regions of the photoresist or the unexposed regions of the photoresist.
Claims7
A method of forming an image on a photoresist comprising:
- forming a photoresist over a substrate;
- applying a topcoat composition onto the photoresist, wherein the topcoat composition comprising at least one fluorine-containing polymer represented by the formula (1) or (2) and a casting solvent comprising an alcohol:
- wherein R is a hydrogen atom, wherein R1 is a branched alkyl group, a branched fluoroalkyl group, or a hydrogen atom, wherein R2 is a fluoroalcohol group, a linear alkyl group, a branched alkyl group, a linear fluoroalkyl group, or a branched fluoroalkyl group, and wherein n and m represent respective molar fractions such that n+m=1;
- removing said casting solvent of said topcoat composition resulting in the formation of a topcoat material over said photoresist;
- exposing said photoresist to radiation, thereby forming exposed and unexposed regions in said photoresist, said radiation changing the chemical composition of said photoresist in said exposed regions;
- and
- removing i) said topcoat material and ii) either said exposed regions of said photoresist or said unexposed regions of said photoresist.
Dependencies are inferred from the claim text.