Extreme ultra violet (EUV) mask
AssigneeSK hynix Inc.
InventorsSung Hyun Oh, Yoon Suk Hyun
Life of this patent
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Abstract
An extreme ultra violet (EUV) mask is disclosed, which prevents defects from shot overlap encountered in wafer exposure as well as reflection of unnecessary EUV and DUV generated in a black border region, such that a pattern CD is reduced and defects are not created. The EUV mask includes a quartz substrate, a multi-layered reflection film formed over the quartz substrate to reflect exposure light, an absorption layer formed over the multi-layered reflection film, a black border region formed over the quartz substrate that does not include the multi-layered reflection film, and a blind layer formed in a position including at least one of over the absorption layer, over the quartz substrate, and below the quartz substrate.
Claims20
An extreme ultra violet (EUV) mask comprising:
- a quartz substrate;
- a black border region formed over the quartz substrate in a shot overlap area;
- a multi-layered reflection film formed over the quartz substrate so that a portion of the black border region is exposed;
- an absorption layer formed over the multi-layered reflection film;
- and
- a first blind layer formed over the absorption layer.
An extreme ultra violet (EUV) mask comprising:
- a quartz substrate;
- a black border region formed over the quartz substrate in a shot overlap area;
- a multi-layered reflection film formed over the quartz substrate so that a portion of the black border region is exposed;
- an absorption layer formed over the multi-layered reflection film;
- and
- a second blind layer formed over the quartz substrate and under the multi-layered reflection film.
An extreme ultra violet (EUV) mask comprising:
- a quartz substrate;
- a black border region formed over the quartz substrate in a shot overlap area;
- a multi-layered reflection film formed over the quartz substrate so that a portion of the black border region is exposed;
- an absorption layer formed over the multi-layered reflection film;
- and
- a third blind layer formed below the quartz substrate.
Dependencies are inferred from the claim text.