Surface treatment method for a mask blank, method of manufacturing a mask blank, and method of manufacturing a mask
AssigneeHoya Corporation
InventorsTakeyuki Yamada, Toshiyuki Suzuki, Masahiro Hashimoto, Yasunori Yokoya
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Abstract
Provided is a mask blank surface treatment method for surface-treating, using a treatment liquid, a surface of a thin film, to be formed into a transfer pattern, of a mask blank having the thin film on a substrate. The thin film is made of a material that can be etched by ion-based dry etching. The concentration of an etching inhibitor contained in the treatment liquid is 0.3 ppb or less.
Claims18
A mask blank surface treatment method for surface-treating, using a treatment liquid, a surface of a thin film, to be formed into a transfer pattern, of a mask blank having the thin film on a substrate,
- wherein the thin film is made of a material containing tantalum,
- the thin film comprises a surface layer made of a material containing tantalum and oxygen,
- the surface layer is treated with the treatment liquid in surface treatment of the thin film,
- the treatment liquid contains etching inhibitor, and
- a concentration of an etching inhibitor contained in the treatment liquid is 0.3 ppb or less.
A mask blank surface treatment method for surface-treating, using a treatment liquid, a surface of a thin film, to be formed into a transfer pattern, of a mask blank having the thin film on a substrate,
- wherein the thin film is a laminated film in which a tantalum nitride film and a tantalum oxide film are laminated together,
- the tantalum nitride film containing tantalum and nitrogen,
- the tantalum oxide film containing tantalum and oxygen,
- the surface of the tantalum oxide film is treated with the treatment liquid in surface treatment of the thin film,
- the treatment liquid contains etching inhibitor, and
- a concentration of an etching inhibitor contained in the treatment liquid is 0.3 ppb or less.
Dependencies are inferred from the claim text.