Optical proximity correction for topographically non-uniform substrates
AssigneeMentor Graphics Corporation
InventorsYuri Granik, Uwe Hollerbach, Konstantinos Adam
Life of this patent
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Abstract
Aspects of the invention relate to techniques of optical simulation for topographically non-uniform substrates. A layout design is simulated to generate an aerial image based on optical models for different types of substrates and for transition regions, along with models for one or more categories of light signals. The one or more categories of light signals comprise trench side-wall reflection signals, trench radiation signals, and trench corner diffraction signals. The one or more categories of light signals may further comprise gate scattering signals and interconnect scattering signals. The models for the one or more categories of light signals may be calibrated with experimental data.
Claims20
One or more non-transitory computer-readable media storing computer-executable instructions for causing one or more processors to perform a method, the method comprising:
- receiving information of a layout design, the layout design corresponding to at least a portion of an integrated circuit;
- constructing models for one or more categories of light signals based on the information of the layout design, the one or more categories of light signals comprising trench side-wall reflection signals, trench radiation signals, and trench corner diffraction signals;
- performing simulation on the layout design to generate an aerial image based on optical models for a plurality of substrate types, one or more optical models for transition regions and the models for the one or more categories of light signals;
- and
- storing information of the aerial image.
A method, comprising:
- with a computer,
- receiving information of a layout design, the layout design corresponding to at least a portion of an integrated circuit;
- constructing models for one or more categories of light signals based on the information of the layout design, the one or more categories of light signals comprising trench side-wall reflection signals, trench radiation signals, and trench corner diffraction signals;
- performing simulation on the layout design to generate an aerial image based on optical models for a plurality of substrate types, one or more optical models for transition regions and the models for the one or more categories of light signals;
- and
- storing information of the aerial image.
A system comprising:
- one or more processors, the one or more processors programmed to perform a method, the method comprising:
- receiving information of a layout design, the layout design corresponding to at least a portion of an integrated circuit;
- constructing models for one or more categories of light signals based on the information of the layout design, the one or more categories of light signals comprising trench side-wall reflection signals, trench radiation signals, and trench corner diffraction signals;
- performing simulation on the layout design to generate an aerial image based on optical models for a plurality of substrate types, one or more optical models for transition regions and the models for the one or more categories of light signals;
- and
- storing information of the aerial image.
Dependencies are inferred from the claim text.