Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method

A substrate positioning device for a lithographic apparatus comprising:

• a substrate table positioning device comprising;
• a balance mass,
• first, second, third, and fourth bearings configured to movably support the balance mass on a base frame, and
• a hinge provided between the balance mass and the first and second bearings, the hinge being configured to allow the first and second bearings to move independently of the third and fourth bearings;
• a substrate table configured to support a substrate;
• and
• a positioner configured to position the substrate table by exerting forces between the balance mass and the substrate table.

An inspection apparatus for inspecting substrates, the inspection apparatus comprising:

• a substrate positioning device comprising:
• a substrate table positioning device comprising:
• a balance mass,
• first, second, third, and fourth bearings configured to movably support the balance mass on a base frame, and
• a hinge provided between the balance mass and the first and second bearings, the hinge being configured to allow the first and second bearings to move independently of the third and fourth bearings,
• a substrate table configured to support a substrate,
• and
• a positioner configured to position the substrate table by exerting forces between the balance mass and the substrate table;
• a radiation device configured to irradiate the substrate supported by the substrate table;
• a detector configured to receive radiation originating from the radiation device that has been scattered by the substrate;
• and
• a processing unit configured to analyze the received radiation,
• wherein the positioner is configured to move the substrate table relative to the radiation device to change a portion of the substrate that is irradiated.

A lithographic apparatus comprising:

• a support configured to support a patterning device, the patterning device being configured to impart a radiation beam with a pattern in its cross-section to form a patterned radiation beam;
• a projection system configured to project the patterned radiation beam onto a target portion of a substrate;
• and
• a substrate positioning device comprising:
• a substrate table positioning device comprising:
• a balance mass,
• first, second, third, and fourth bearings configured to movably support the balance mass on a base frame, and
• a hinge provided between the balance mass and the first and second bearings, the hinge being configured to allow the first and second bearings to move independently of the third and fourth bearings;
• a substrate table configured to support the substrate;
• and
• a positioner configured to position the substrate table by exerting forces between the balance mass and the substrate table,
• wherein the positioner is configured to move the substrate table relative to the projection system to change the portion of the substrate that is the target portion.

A lithographic cell comprising:

• a coater configured to coat a substrate with a radiation sensitive layer;
• a lithographic apparatus configured to expose images onto the radiation sensitive layer of the substrate coated by the coater;
• a developer configured to develop images exposed by the lithographic apparatus;
• and
• an inspection apparatus configured to inspect substrates, the inspection apparatus comprising:
• a substrate positioning device comprising:
• a substrate table positioning device comprising:
• a balance mass,
• first, second, third, and fourth bearings configured to movably support the balance mass on a base frame, and
• a hinge provided between the balance mass and the first and second bearings, the hinge being configured to allow the first and second bearings to move independently of the third and fourth bearings,
• a substrate table configured to support the substrate,
• and
• a positioner configured to position the substrate table by exerting forces between the balance mass and the substrate table;
• a radiation device configured to irradiate the substrate supported by the substrate table;
• a detector configured to receive radiation originating from the radiation device that has been scattered by the substrate;
• and
• a processor configured to analyze the received radiation,
• wherein the positioner is configured to move the substrate table relative to the radiation device to change a portion of the substrate that is irradiated.

A device manufacturing method comprising:

• transferring a pattern from a patterning device onto a target portion of a substrate;
• and
• positioning the substrate using a substrate positioning device to change the portion of the substrate that is the target portion, the substrate positioning device comprising a substrate table positioning device, the positioning of the substrate comprising:
• supporting, using a substrate table, the substrate;
• moving, using a positioning actuator, the substrate table;
• balancing, using a balance mass, the movement of the substrate table;
• and
• supporting movably, using first, second, third, and fourth bearings, the balance mass on a base frame,
• allowing the first and second bearings to move independently of the third and fourth bearings on a hinge provided between the balance mass and the first and second bearings.

A substrate inspection method comprising:

• irradiating a substrate that is supported by a substrate table;
• detecting radiation that has been scattered by the substrate;
• analyzing the detected radiation;
• and
• positioning the substrate using a substrate positioning device to change the portion of the substrate being inspected, the substrate positioning device including
• a substrate table positioning device comprising:
• a balance mass,
• first, second, third, and fourth bearings configured to movably support the balance mass on a base frame, and
• a hinge provided between the balance mass and the first and second bearings, the hinge being configured to allow the first and second bearings to move independently of the third and fourth bearings;
• a substrate table configured to support the substrate;
• and
• a positioner configured to position the substrate table by exerting forces between the balance mass and the substrate table.