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US 8,795,929 B2Granted
Pellicle having buffer zone and photomask structure having pellicle
AssigneeSamsung Electronics Co., Ltd.
InventorsSung-Hyuck Kim, In-Kyun Shin, Bum-Hyun An
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Abstract
A pellicle including a frame having a square shape; and a buffer zone in the frame, the buffer zone dividing a lower surface of the frame into a plurality of portions.
Claims17
A pellicle, comprising:
- a frame having a square shape;
- and
- a slit-type buffer zone in the frame, the slit-type buffer zone dividing a lower surface of the frame into a plurality of portions,
- wherein the slit-type buffer zone penetrates from an inner surface to an outer surface of the frame,
- wherein the vertical height of the slit-type buffer zone is greater than a half of the vertical height of the frame, and
- wherein the slit-type buffer zone is configured to impart flexibility to the frame.
3 more elements
A photomask structure, comprising:
- a photomask including an optical pattern thereon;
- and
- a pellicle mounted on the photomask and covering the optical pattern, the pellicle including a frame and a slit-type buffer zone, the slit-type buffer zone having an opening in a lower surface of the frame,
- wherein the slit-type buffer zone penetrates from an inner surface to an outer surface of the frame,
- wherein the vertical height of the slit-type buffer zone is greater than a half of the vertical height of the frame, and
- wherein the slit-type buffer zone is configured to impart flexibility to the frame.
3 more elements
A pellicle, comprising:
- a substantially rectangular frame including a first pair of parallel sides and a second pair of parallel sides, the first pair of parallel sides and the second pair of parallel sides intersecting at corner portions;
- and
- one or more slit-type buffer zones in the frame, the one or more slit-type buffer zones including an opening in a lower surface of the frame,
- wherein the slit-type buffer zone penetrates from an inner surface to an outer surface of the frame,
- wherein the vertical height of the slit-type buffer zone is greater than a half of the vertical height of the frame, and
- wherein the one or more slit-type buffer zones are configured to impart flexibility to the frame.
3 more elements
Dependencies are inferred from the claim text.