Wave-shaped mask of fabricating nano-scaled structure
AssigneeNational Taiwan University
InventorsSi-Chen Lee, Fang-Tzu Chuang, Yu-Wei Jiang
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Abstract
A wave-shaped mask for fabricating a nano-scale structure is disclosed. The wave-shaped mask comprises an elastomeric transparent substrate having an upper surface and a lower surface, and a light-penetrable thin film layer disposed on the upper surface of the elastomeric transparent substrate. The upper surface of the elastomeric transparent substrate and the light-penetrable thin film layer are in a periodic wave shape, and the lower surface of the elastomeric transparent substrate is in a plate shape.
Claims22
A wave-shaped mask for fabricating a nano-scale structure, the wave-shaped mask comprising:
- an elastomeric transparent substrate comprising an upper surface and a lower surface;
- and
- a light-penetrable thin film layer disposed on the upper surface of the elastomeric transparent substrate,
- wherein the upper surface of the elastomeric transparent substrate and the light-penetrable thin film layer comprise aperiodic curved wave shape, and
- wherein the lower surface of the elastomeric transparent substrate is in plate shape;
- wherein the periodic curved wave shape of the elastomeric transparent substrate and the light penetrable thin film layer are formed because the Young's modulus of the light-penetrable thin film layer is larger than the Young's modulus of the elastomeric transparent substrate.
A wave-shaped mask for fabricating a nano-scale structure, the wave-shaped mask comprising:
- an elastomeric transparent substrate comprising an upper surface and a lower surface;
- wherein the upper surface of the elastomeric transparent substrate is treated with a surface treatment to form a light-penetrable thin film layer which comprises a periodic curved wave shape, and
- wherein the lower surface of the elastomeric transparent substrate is in plate shape, and wherein the periodic curved wave shape of the light-penetrable thin film layer is formed because of the Young's modulus of the light-penetrable thin film layer is larger than the Young's modulus of the elastomeric transparent substrate.
A wave-shaped mask for fabricating a nano-scale structure, the wave-shaped mask comprising:
- an elastomeric transparent substrate comprising an upper surface and a lower surface;
- and
- a light-penetrable thin film layer disposed on the upper surface of the elastomeric transparent substrate,
- wherein the upper surface of the elastomeric transparent substrate and the light-penetrable thin film layer comprise a curved wave shape, and
- wherein the lower surface of the elastomeric transparent substrate is in a plate shape;
- and wherein the curved wave shape of the elastomeric transparent substrate and the light-penetrable thin film layer are formed because the Young's modulus of the light-penetrable thin film layer is larger than the Young's modulus of the elastomeric transparent substrate.
Dependencies are inferred from the claim text.