Layout design defect repair using inverse lithography

A method, comprising:

• with a computer,
• receiving information of an altered layout design and one or more errors detected in the altered layout design, the altered layout design generated by performing a resolution enhancement process on a layout design, the layout design representing at least a portion of an integrated circuit design;
• determining a re-correction region around at least one of the one or more detected errors, wherein the re-correction region designates a sub-portion of the altered layout design and includes three portions—core, transition and visible, wherein the core portion is enclosed by the transition portion and the transition portion is enclosed by the visible portion;
• performing an optical proximity correction process on the core portion of and the transition portion of the re-correction region while taking into account effects from the visible portion of the re-correction region to generate a modified re-correction region, wherein the transition portion is processed based on distance from boundary between the transition portion and the core portion such that layout features near the boundary between the transition portion and the core portion are adjusted more than layout features farther away from the boundary;
• saving information of the modified re-correction region to a memory storage location.

A system comprising:

• receiving information of an altered layout design and one or more errors detected in the altered layout design, the altered layout design generated by performing a resolution enhancement process on a layout design, the layout design representing at least a portion of an integrated circuit design;
• determining a re-correction region around at least one of the one or more detected errors, wherein the re-correction region designates a sub-portion of the altered layout design and includes three portions—core, transition and visible, wherein the core portion is enclosed by the transition portion and the transition portion is enclosed by the visible portion;
• performing an optical proximity correction process on the core portion of and the transition portion of the re-correction region while taking into account effects from the visible portion of the re-correction region to generate a modified re-correction region, wherein the transition portion is processed based on distance from boundary between the transition portion and the core portion such that layout features near the boundary between the transition portion and the core portion are adjusted more than layout features farther away from the boundary;
• saving information of the modified re-correction region to a memory storage location.