Shear-layer chuck for lithographic apparatus

A lithographic apparatus, comprising:

• an illumination system configured to produce a beam of radiation;
• a patterning device configured to pattern the beam of radiation;
• a projection system configured to project the patterned beam of radiation onto a substrate;
• and
• a support structure comprising,
• a chuck having a first surface and a second surface, the second surface being located opposite the first surface, and the first surface supports either the patterning device or the substrate,
• an array of elongated elements having first and second respective ends and having longitudinal axes, the longitudinal axes being normal to the second surface of the chuck, such that the first ends contact the second surface of the chuck and the second ends contact a stage, and
• an interface membrane layer disposed between the chuck and the stage, such that the array of elongated elements passes through the interface layer,
• wherein the array of elongated elements are configured such that a transfer of stress between the stage and the chuck is rendered substantially uniform, resulting in minimization of slippage of the object relative to the first surface of the chuck during a deformation of the chuck due to the stress.

A system comprising:

• a chuck having a first surface and a second surface, the second surface being located opposite the first surface, wherein the chuck is configured to hold an object;
• an array of elongated elements having first and second respective ends and having longitudinal axes normal to the second surface of the chuck, wherein the first ends contact the second surface of the chuck and the second ends contact a stage to isolate the chuck from the stage by rigidly coupling the chuck to the stage such that the array of elongated elements uniformly distribute stress there between;
• and
• an interface membrane layer disposed between the chuck and the stage, such that the array of elongated elements passes through the interface layer,
• wherein, through using the array of elongated elements, slippage of the object relative to the first surface of the chuck is minimized during a deformation of the chuck due to stress when the stage is accelerated.