Arrangement for actuating an element in a microlithographic projection exposure apparatus

An arrangement, comprising:

• a deformable optical element configured so that an adjustable force is transmittable to the deformable optical element in a first number of degrees of freedom, the deformable optical element being actively deformable by actuators;
• a second number of actuators, each actuator being coupled to the deformable optical element via a mechanical coupling to transmit a force to the deformable optical element in at least one of the degrees of freedom, the second number being greater than the first number;
• and
• a position controller configured to drive the second number of actuators based on a static transformation matrix and a driving signal for the deformation of the deformable optical element, the elements of the static transformation matrix being such that the second number of actuators actuate only translational and/or rotational rigid-body degrees of freedom of the deformable optical element.