Light-guiding structure, image sensor including the light-guiding structure, and processor-based system including the image sensor

An image sensor comprising:

• a conductive pattern disposed on a semiconductor substrate;
• first, second, and third insulating layers disposed sequentially on the semiconductor substrate and the conductive pattern;
• and
• a light-guiding structure disposed adjacent to the conductive pattern and configured to vertically penetrate the second and third insulating layers to extend to the first insulating layer,
• wherein the light-guiding structure includes a bottom surface parallel to a main surface of the semiconductor substrate and disposed in the first insulating layer and a sidewall disposed in the first through third insulating layers and tapered, and
• the first insulating layer is not vertically between a lower surface of the second insulating layer and an upper surface of the conductive pattern underneath.

An image sensor comprising:

• a substrate;
• a conductive pattern on the substrate;
• an anti-reflective layer on the substrate and on the conductive pattern;
• a first insulating layer on the anti-reflective layer;
• a light-guiding structure that extends into, but not through, the first insulating layer;
• a second insulating layer on the conductive pattern;
• and
• at least one wire on the second insulating layer,
• wherein the anti-reflective layer is in contact with the second insulating layer through an opening defined by the first insulating layer above an upper surface of the conductive pattern.