US 8,785,890 B2Granted

Charged particle beam apparatus permitting high-resolution and high-contrast observation

AssigneeHitachi High-Technologies Corporation

InventorsMuneyuki Fukuda, Naomasa Suzuki, Tomoyasu Shojo, Noritsugu Takahashi

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Abstract

A lower pole piece of an electromagnetic superposition type objective lens is divided into an upper magnetic path and a lower magnetic path. A voltage nearly equal to a retarding voltage is applied to the lower magnetic path. An objective lens capable of acquiring an image with a higher resolution and a higher contrast than a conventional image is provided. An electromagnetic superposition type objective lens includes a magnetic path that encloses a coil, a cylindrical or conical booster magnetic path that surrounds an electron beam, a control magnetic path that is interposed between the coil and sample, an accelerating electric field control unit that accelerates the electron beam using a booster power supply, a decelerating electric field control unit that decelerates the electron beam using a stage power supply, and a suppression unit that suppresses electric discharge of the sample using a control magnetic path power supply.

Claims13

Dependent claims

A charged particle beam apparatus, comprising:

a stage for placing a sample thereon;
a detector detecting secondary charged particles generated due to irradiate a primary charged particle beam to the sample;
an objective lens that focuses the primary charged particle beam on the sample and having an opening through which the primary charged particle beam passes;
and
a power supply unit applying a negative voltage to the sample,
wherein the objective lens includes:
a first magnetic pole member that is disposed around the opening and has a terminal portion at a sample side thereof that functions as an upper magnetic pole member of the objective lens;
a second magnetic pole member that supplies a magnetic flux to the first magnetic pole member and is formed with a hollow interior;
a coil that is disposed within the second magnetic pole member and supplies a magnetic flux to the second magnetic pole member;
and
a third magnetic pole member that is disposed between the stage and the second magnetic pole member, has the opening and functions as lower magnetic pole member of the objective lens, and
wherein a potential lower than that of the second magnetic pole member is supplied to the third magnetic pole member.

9 more elements

Dependencies are inferred from the claim text.

Facts

Application: 13/871,624Filed 26 Apr 2013 · continuation
Priority: JP 2008-10423214 Apr 2008
Published: US 2013/0228701 A15 Sep 2013
Granted: 22 Jul 2014
Term ends: Not estimatedThe source records don’t support an estimate.

Classification7 codes

H01J 37/28
Electron or ion microscopes; Electron or ion diffraction tubes: with scanning beams
G01N 23/225
By measuring secondary emission from the material: using electron or ion
H01J 37/145
Lenses: combinations of electrostatic and magnetic lenses
H01J 2237/21
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging: focus adjustment

Family

Application12/385,612Parent of this continuation · filed 14 Apr 2009
Application13/551,452Parent of this continuation · filed 17 Jul 2012
US 8,389,935 B2Parent of this continuation · filed 5 Mar 2013
US 2013/0228701 A1Pre-grant publication · published 5 Sep 2013
US 8,431,915 B2Parent of this continuation
US 2009/0256076 A1Published application
US 2012/0280126 A1Published application
US 8,785,890 B2This patent

From the US filing history. Foreign family members aren’t listed.

Timeline

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