Organic TFT array substrate and manufacture method thereof
AssigneeBoe Technology Group Co., Ltd.
InventorXuehui Zhang
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Abstract
According to an embodiment of the disclosed technology, a manufacture method of an organic thin film transistor array substrate is provided. The method comprises: forming a first pixel electrode, a source electrode, a drain electrode and a data line in a first patterning process; forming an organic semiconductor island and a gate insulating island in a second patterning process; forming a data pad region in a third patterning process; and forming a second pixel electrode, a gate electrode and a gate line in a fourth patterning process.
Claims10
A manufacture method of an organic thin film transistor array substrate comprising:
- sequentially forming a first transparent conductive film and a source-drain metal film on a base substrate and then performing a first patterning process to form a first pixel electrode, a source electrode, a drain electrode and a data line;
- sequentially forming an organic semiconductor film and a gate insulating film and then performing a second patterning process to form an organic semiconductor island and a gate insulating island, wherein both the organic semiconductor island and the gate insulating island are provided above the source electrode and the drain electrode;
- forming a passivation layer and then performing a third patterning process to form a data pad region;
- and
- sequentially forming a second transparent conductive film and a gate metal film and then performing a fourth patterning process to form a second pixel electrode, a gate electrode and a gate line.
Dependencies are inferred from the claim text.