Substrate processing apparatus, substrate processing method, and program for implementing the method
AssigneeTokyo Electron Limited
InventorsSatoshi Yamazaki, Mitsuru Hashimoto
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AssigneeTokyo Electron Limited
InventorsSatoshi Yamazaki, Mitsuru Hashimoto
Estimating the term…
A substrate processing method which is capable of enhancing productivity in manufacturing product substrates. In process chambers of an etching apparatus, etching is carried out on a substrate as an object to be processed, and dummy processing is carried out on at least one non-product substrate before execution of the etching. A host computer determines whether or not the dummy processing is to be executed. The host computer determines whether or not the interior of each of the process chambers and is in a stable state, and omits the execution of the dummy processing when it is determined that it is in the stable state.
A substrate processing method for a substrate processing apparatus, the apparatus including at least one process chamber in which predetermined processing is carried out on a substrate as an object to be processed, the method comprising:
A non-transitory computer-readable storage medium storing a program for causing a computer to execute a substrate processing method for a substrate processing apparatus including at least one process chamber in which predetermined processing is carried out on a substrate as an object to be processed, the substrate processing method comprising:
Dependencies are inferred from the claim text.