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US 8,785,108 B2Granted
Structure for pattern formation, method for pattern formation, and application thereof
AssigneeDai Nippon Printing Co., Ltd.
InventorsHironori Kobayashi, Manabu Yamamoto, Daigo Aoki, Hironori Kamiyama, Shinichi Hikosaka, Mitsuhiro Kashiwabara
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Abstract
A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
Claims5
A structure comprising:
- a substrate;
- a photocatalyst-containing layer provided on the substrate, containing titanium oxide as a photocatalyst, and having a high critical surface tension;
- and,
- a patterned layer having a low critical surface tension which is decomposable and removable through photocatalytic action and provided on the photocatalyst-containing layer,
- wherein the photocatalyst-containing layer contains a compound having a siloxane bond.
2 more elements
A structure comprising:
- a substrate;
- a photocatalyst-containing layer provided on the substrate, containing titanium oxide as a photocatalyst, and having a high critical surface tension;
- and,
- a patterned layer having a low critical surface tension which is decomposable and removable through photocatalytic action and provided on the photocatalyst-containing layer,
- wherein the photocatalyst-containing layer contains silicone.
2 more elements
Dependencies are inferred from the claim text.