Multilayer structure and method for producing same
AssigneeKuraray Co., Ltd.
InventorsTakeyuki Igarashi, Yasuhiko Haneda, Masahiro Kitamura
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AssigneeKuraray Co., Ltd.
InventorsTakeyuki Igarashi, Yasuhiko Haneda, Masahiro Kitamura
Estimating the term…
A multilayer structure, comprising: a layer of a resin composition (A); a layer of a saponified ethylene-vinyl acetate copolymer (B); and a layer of polyolefin (C) arranged on one side or both sides of those layers, wherein the resin composition (A) contains polyolefin (D), a saponified ethylene-vinyl acetate copolymer (E) and a saponified ethylene-vinyl acetate copolymer (F1) and/or an acid-modified ethylene-vinyl acetate copolymer (F2), the copolymer (E) has a mass ratio [E/(F1+F2)] of from 0.05 to 30, the polyolefin (D) has the copolymer (E) having an average particle diameter of from 0.1 to 1.8 μm dispersed in a matrix thereof, the layers of (A) and of (C) have thicknesses of from 50 to 1000 μm, and from 25 to 1000 μm, respectively, which enables provision of a multilayer structure having good gas barrier properties after retort processing and a good appearance.
A retort processed package, comprising:
Dependencies are inferred from the claim text.