High density refractory metals and alloys sputtering targets

A method of forming a sputtering-target plate that is sputterable to form highly uniform, low-resistivity films of a refractory metal selected from the group consisting of molybdenum, tungsten, an alloy of molybdenum and tungsten, molybdenum alloyed with a metal other than tungsten, and tungsten alloyed with a metal other than molybdenum, the method comprising:

• cold isostatically pressing a powder of the refractory metal at a pressure selected from the range of 15,000 psi to 36,000 psi to form a pressed product;
• heating the pressed product under vacuum at a rate of about 20° F. to about 120° F. to a first temperature selected from the range of about 300° F. to about 1000° F. and holding the pressed product at the first temperature for a period selected from the range of about 1 hour to about 38 hours;
• heating the pressed product under vacuum at a rate of about 20° F. to about 120° F. from the first temperature to a second temperature selected from the range of about 1500° F. to about 2800° F. and holding the pressed product at the second temperature for a period selected from the range of about 1 hour to about 38 hours;
• heating the pressed product under vacuum at a rate of about 20° F. to about 120° F. from the second temperature to a third temperature selected from the range of about 3000° F. to about 4000° F. and holding the pressed product at the third temperature for a period selected from the range of about 1 hour to about 38 hours;
• allowing the pressed product to cool to room temperature;
• and
• machining the pressed product to a desired size, thereby forming the sputtering-target plate that is sputterable to form highly uniform, low-resistivity films of the refractory metal, the sputtering-target plate having a density greater than 97% of a theoretical density of the refractory metal.