Film coating apparatus
AssigneeHon Hai Precision Industry Co., Ltd.
InventorChia-Ling Hsu
Life of this patent
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Abstract
A film coating apparatus for coating a patterned roller using an atomic layer deposition process includes a deposition chamber and a heater. The deposition chamber defines an inlet and an outlet. The inlet is misaligned with the outlet. The heater is received in the deposition chamber. The heater includes a number of coiled filaments each formed into a generally circular loop. The filaments are spaced from each other and surrounds the patterned roller. The filaments are configured for heating the patterned roller.
Claims5
A film coating apparatus for coating a patterned roller using an atomic layer deposition process, comprising:
- a deposition chamber defining an inlet and an outlet and comprising an inner upper surface, an inner lower surface, as first inner side surface, and a second inner side surface connected to each other end-to-end, the inner upper surface facing the inner lower surface, the first inner side surface facing the second inner side surface, the inlet being misaligned with the outlet;
- and
- a heater received in the deposition chamber, the heater comprising a plurality of coiled filaments each being a closed ring, the closed ring defining a through hole in a middle thereof, the filaments being spaced from each other with each filament surrounding the patterned roller, each filament being in contact with the inner upper surface, the first inner side surface, the inner lower surface, and the second inner side surface, the patterned roller extending through all of the through holes of the filaments, the filaments configured for heating the patterned roller.
Dependencies are inferred from the claim text.