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US 8,784,563 B2Granted
Gas mixer and manifold assembly for ALD reactor
AssigneeASM America, Inc.
InventorsRyan M Schmidt, Mohith Verghese
Life of this patent
Estimating the term…
Abstract
A system and method for mixing a plurality of gases for an atomic layer deposition (ALD) reactor. The mixer is configured to mix the plurality of gases while minimizing the potential for re-circulation within the mixer. The mixer is further configured to maintain the flow velocity of the plurality of gases as the gases pass through the mixer.
Claims7
A gas distribution system for use with an Atomic Layer Deposition (ALD) chamber, the gas distribution system comprising:
- a first reactant line;
- a second reactant line;
- and
- a mixer communicating with the first and second reactant lines and a source of inert gas, and configured to form a mixture of a reactant gas from the second reactant line with a buffer gas from the first reactant line, the mixer comprising an upstream member having a base, a distal end located in a downstream direction from the base, and an outer mixing surface located between the base and the distal end, the outer mixing surface narrowing in the downstream direction and having a shape which causes circular flow of the reactant gas from the second reactant line and the buffer gas to form the mixture.
1 more element
A gas distribution system for use with an Atomic Layer Deposition (ALD) chamber, the gas distribution system comprising:
- a first reactant line;
- a second reactant line;
- and
- a mixer communicating with the first and second reactant lines and a source of inert gas, and configured to form a mixture of a reactant gas from the second reactant line with a buffer gas from the first reactant line, the mixer comprising an upstream member having a base, a distal end located downstream of the base, and a first mixing surface located between the base and the distal end, the first mixing surface having a shape which causes circular flow of the reactant gas from the second reactant line and the buffer gas to form the mixture, wherein the upstream member comprises,
- a second mixing surface located parallel to a portion of the first mixing surface,
- a trough circumscribing the base and forming a transition surface between the first and second mixing surfaces, and
- an inlet;
- and
- wherein the mixer comprises a downstream member in flow communication with the upstream member and having a generally tapering inner surface, the first and second mixing surfaces, the trough, and the tapering inner surface together forming at least a portion of a chamber.
6 more elements
Dependencies are inferred from the claim text.