Maintenance liquid
AssigneeFUJIFILM Corporation
InventorsKunihiko Kodama, Kenichi Kodama
Life of this patent
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Abstract
Disclosed is a maintenance liquid for property carrying out imprints excellent in patternability. The maintenance liquid for imprints of an ink-jet discharging device comprises a compound comprising an ester group and/or an ether group.
Claims19
A maintenance liquid for an ink-jet device used for a method of forming a pattern, the method including a process of discharging, using the ink-jet device, a photo-curable composition mainly composed of a polymerizable monomer, onto a substrate or a mold having a fine pattern formed thereon, applying the other one of the substrate and the mold onto the photo-curable composition and irradiating light onto the photo-curable composition held between the substrate and the mold having a fine pattern formed thereon,
- the maintenance liquid containing a compound having an ester group and/or an ether group, and a polymerizable monomer, and the maintenance liquid contains no photopolymerization initiator;
- wherein a ratio of area corresponded to polymerization products of the polymerizable monomer in the maintenance liquid is 0.5% or smaller relative to the polymerizable monomer, when measured by gel permeation chromatography (GPC) using a differential refractometer (RI detector);
- and
- at least one species of the polymerizable monomer contained in the maintenance liquid is a polymerizable monomer represented by the following formula:
- wherein Ar is an arylene group which may have a substituent, X is a single bond or an organic linking group, R1 is a hydrogen atom or a methyl group, and n is 2 or 3.
A maintenance liquid for an ink-jet device used for a method of forming a pattern, the method including a process of discharging, using the ink-jet device, a photo-curable composition mainly composed of a polymerizable monomer, onto a substrate or a mold having a fine pattern formed thereon, applying the other one of the substrate and the mold onto the photo-curable composition and irradiating light onto the photo-curable composition held between the substrate and the mold having a fine pattern formed thereon,
- the maintenance liquid containing a compound having an ester group and/or an ether group, and a polymerizable monomer, and the maintenance liquid having a boiling point at 1 atm of 150° C. or higher;
- wherein a ratio of area corresponded to polymerization products of the polymerizable monomer in the maintenance liquid is 0.5% or smaller relative to the polymerizable monomer, when measured by gel permeation chromatography (GPC) using a differential refractometer (RI detector);
- and
- at least one species of the polymerizable monomer contained in the maintenance liquid is a polymerizable monomer represented by the following formula:
- wherein Ar is an arylene group which may have a substituent, X is an organic linking group, R1 is a hydrogen atom or a methyl group, and n is 2 or 3.
Dependencies are inferred from the claim text.